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High k Workshop 2017

NaMLab invited to the Novel High-k Application Workshop on March 9th and 10th, 2017. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics were discussed by more than 90 participants from industry, research institutes and universities.
When Mar 09, 2017 09:00 AM to
Mar 10, 2017 06:00 PM
Where MPI PKS, Noethnitzer Strasse 38, Dresden
Contact Name Uwe Schroeder
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In this series of annual workshops NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss latest experimental results on MIM-capacitors, process technology, leakage & reliability as well as characterization of high-k dielectrics integrated in silicon based micro– and nanoelectronics. The ferroelectric properties of doped HfO2 and ZrO2 were discovered 10 years ago. On the second day of the workshop, root causes for the formation of this so far unknown phase will be discussed.

Registration for the workshop closed:

- registration rate: participants: 12€/day  - students: 10€/day  (includes all meals and coffee breaks)

- registration rate can be paid by credit card, pay pal (Europe only: direct transfer - 'Sofort Ueberweisung')

- a 'XING attendee webpage' is not available


Agenda:    March 9th  and March 10th

Workshop location: Max Planck Institute PKS (Physics of Complex Systems), Noethnitzer Strasse 38




Co-organized by:COST Action MP1402 - HERALD     Project MP1402 is part of COST             and         



Confirmed list of speakers:


March 9th: Novel High k Application Workshop

Novel Devices

- E. Erben (GlobalFoundries Dresden)

- M. Vinet/H. Boutry (LETI Grenoble)

- M. Godlewski (Polish Academy of Sciences, Warsaw)

Novel Processes

- A. O'Mahony (Oxford Instruments)

- M. Knaut (IHM/TU Dresden)

- D. Schmeisser (BTU Cottbus - Senftenberg)

- F. Johann (Oxford Instruments)

RRAM Devices

- CS Hwang (Seoul National University)

- J. Robertson (Univ. Cambridge)

- C. Wenger (IHP Frankfurt/Oder)

- U. Böttger (RWTH Aachen)

Ferroelectric Devices

- M. Trentzsch (GlobalFoundries Dresden)

- K. Florent/J. van Houdt (IMEC, Leuven)

- A. Markeev + A. Chernikova (Moscow IPT)


March 10th: Workshop on ferroelectric HfO2

Impact of dopants and oxygen vacancies

- L. Larcher (Univ. of Modena)

- A. Dimoulas (N.C.S.R. Demokritos, Athens)

- P. Polakowski/J. Mueller (Fraunhofer IPMS/CNT)

- A. Kersch (UAS Munich)

- R. Batra (Univ. of Conneticut)

Epitaxial Growth

- T. Shimizu (Tokyo Institute of Technology)

- J. Schubert (FZ Jülich)

Domain structure, nucleation and switching dynamics on nanoscale

- I. Stolichnow (EPFL, Lausanne)

Thickness Scaling

- U. Böttger (RWTH Aachen)

- A. Zenkevich (Moscow IPT)

Negative Capacitance Devices

- S. Salahuddin (UC Berkeley)

- CS Hwang (Seoul National University)

- A. Ionescu (EPFL, Lausanne)

- M. Hoffmann (Namlab)






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01187 Dresden

Phone: +49.351.21.24.990-00
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