Have a look at our image video
NaMLab invites to the Novel High-k Application Workshop on March 9th and 10th, 2017. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics will be discussed by more than 80 participants from industry, research institutes and universities. One main focus will be on the ferroelectric properties of HfO2.
Back to the roots: Germanium outperforms silicon in energy efficient transistors with n-und p-conduction
Editor’s Pick in Journal of Vacuum Science & Technology B: MBE growth of ultra-pure GaN.
The annual report can be download here.